Tokyo Electron LPCVD Reactor (TEL Alpha 8S)
TEL Alpha 8S LPCVD reactor ( Sub Model # ZVFN FTP-LHP) configured
for deposition of PolySi, silicon nitride or silicon dioxide on 200 mm
wafers.
Tool is fully automated and features cassette-to-cassette operation and
fast thermal processing capabilities.
Gases plumbed are:
Tool is equipped with an Ebara Turbo Pump and TS-4000Z controller.
for deposition of PolySi, silicon nitride or silicon dioxide on 200 mm
wafers.
Tool is fully automated and features cassette-to-cassette operation and
fast thermal processing capabilities.
Gases plumbed are:
- MFC 1 - 5 slm O2
- MFC 2 - 20 slm N2
- MFC 3 - 5 slm N2
- MFC 4 - 5 slm ClF3
- MFC 5 - 500 sccm HCl
- MFC 6 - 200 sccm SiH2Cl2
- MFC 7 - 5 slm House N2
- MFC 8 - 10 slm Ar
- MFC 9 - 200 sccm SiH4
- MFC 10 - 2.0 sccm SiH4
- MFC 11 - 2 slm NH3
- MFC 13 - 10 slm H2
Tool is equipped with an Ebara Turbo Pump and TS-4000Z controller.
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