for deposition of PolySi, silicon nitride or silicon dioxide on 200 mm
wafers.
Tool is fully automated and features cassette-to-cassette operation and
fast thermal processing capabilities.
Gases plumbed are:
oMFC 1 - 5 slm O2
oMFC 2 - 20 slm N2
oMFC 3 - 5 slm N2
oMFC 4 - 5 slm ClF3
oMFC 5 - 500 sccm HCl
oMFC 6 - 200 sccm SiH2Cl2
oMFC 7 - 5 slm House N2
oMFC 8 - 10 slm Ar
oMFC 9 - 200 sccm SiH4
oMFC 10 - 2.0 sccm SiH4
oMFC 11 - 2 slm NH3
oMFC 13 - 10 slm H2
Tool is equipped with an Ebara Turbo Pump and TS-4000Z controller.
