Tokyo Electron LPCVD Reactor (TEL Alpha 8S)
Also Available: Tel Alpha 8S Metal Anneal Furnace
TEL Alpha 8S LPCVD reactor ( Sub Model # ZVFN FTP-LHP) configured
for deposition of PolySi, silicon nitride or silicon dioxide on 200 mm
wafers.

Tool is fully automated and features cassette-to-cassette operation and
fast thermal processing capabilities.

Gases plumbed are:

  • MFC 1 - 5 slm O2
  • MFC 2 - 20 slm N2
  • MFC 3 - 5 slm N2
  • MFC 4 - 5 slm ClF3
  • MFC 5 - 500 sccm HCl
  • MFC 6 - 200 sccm SiH2Cl2
  • MFC 7 - 5 slm House N2
  • MFC 8 - 10 slm Ar
  • MFC 9 - 200 sccm SiH4
  • MFC 10 - 2.0 sccm SiH4
  • MFC 11 - 2 slm NH3
  • MFC 13 - 10 slm H2

Tool is equipped with an Ebara Turbo Pump and TS-4000Z controller.
Click Photos Below To Enlarge
Download General Specs and Schematics
Download Control System Specs
Download Furnace Specs
Download Gas System Specs
Download Download Gas Flow Schematics
Download Mechanism Specs
Download Nitrogen Purge System Specs
Download Quartz Jig Specs
Download Safety Specs
setstats