sputtering chambers and a plasma
pre-sputter clean chamber. System is fully
automated and configured for processing
200 mm wafers. System comes with several
different targets and spare parts.
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| Varian M2000/8 Sputtering System |
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| Download Varian M2000/8 Sputtering System Description |
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| Click Photos to Enlarge |
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| Varian M2000 cluster tool consisting of 5 sputtering chambers and a plasma pre-sputter clean chamber. System is fully automated and configured for processing 200 mm wafers. System comes with several different targets and spare parts. |
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