Thermco Model 4504 Four Stack LPCVD Reactor configured for PolySi,
Silicon Nitride, SiO2/PSG/BPSG, and TEOS/PTEOS/BPTEOS. System
is complete, fully operational, and still in Cleanroom. System is
capable of processing wafers up to 6" in diameter. System is
equipped with all SiC paddles and TMX 9000 controllers.
