Steed Technology Wet Oxidation and LPCVD (SiN) Deposition Furnace
Download Steed Technology Furnace Diagram
Steed two-stack fully automated horizontal
furnace configured for flexible processing of
up to 200mm wafers at temperatures as high
as 1200C. One stack is to be used for dry/wet
oxidation while the other is to be used for
LPCVD silicon nitride. System is brand new
and still in original shipping crate.
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