STS ASPECT Cluster Etcher
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STS dual chamber ICP cluster etcher (200mm) configured for Bosch
process. Both chambers are identical in configuration with gases and
corresponding MFC sizes, as shown below:

  • C4F8       400 sccm
  • SF6          600 sccm
  • O2            100 sccm
  • Ar                50 sccm
  • CF4            50 sccm
  • CHF3       100 sccm
  • HBr           200 sccm
  • BCl3         100 sccm
  • Cl2            200 sccm
  • He             100 sccm
  • N2             100 sccm
  • N2             200 sccm