Unit offers capabilities for the following:
- Co-sputtering
- Bias sputtering
- Back sputter etching
- Substrate heating
|
|||||||||||||
| MRC 8667 Sputtering System |
|||||||||||||
| Click Photos to Enlarge |
|||||||||||||
| Download MRC 8667 Sputtering System Specs |
|||||||||||||
|
|
||||||||||||
| MRC 8667 Sputtering System is configured for three targets. Unit offers capabilities for the following:
|
|||||||||||||
|
|
||||||||||||
|
|
||||||||||||
