Kokusai DJ-815V-8L LPCVD Reactor
Load-locked, fully automated (CX 2003A
controller)
H
igh throughput
C
assette-to-cassette
vertical reactor
C
apable of handling
8" (200 mm) wafers
C
onfigured for
deposition of both doped Polysi and
S
ilicon
nitride
**Item is crated, but crates can be opened if needed for inspection**
D
ownload
Layout
D
ownload
Assembly (p.1)
D
ownload
Assembly (p.2)
D
ownload
System Specs
D
ownload
Gas Flow Pattern
Do
wnload
Heater Moving
Mechanism