ICCI Two Stack 8" Diffusion and Metal Anneal Furnace
Download ICCI Diffusion and Metal Anneal Furnace Schematic Diagram
ICCI two-stack fully automated horizontal
furnace configured for flexible processing of
up to 200mm wafers at temperatures as high
as 1200C. Top stack used for metal anneal
(no copper) while bottom stack used for dry
oxidation. Furnace is plumbed for nitrogen,
forming gas, hydrogen, argon, and oxygen.
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