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The Hitachi SCDS is designed for processing PFC gases used in semiconductor fabrication. The system features a 60l/min gas throughput and decomposition rates of over 99.4% for CF4, C2F6, CHF3, C3F8, C4F8, NF3, CO and SF6.
The Hitachi SCDS offers superior cost of ownership versus Capture/Re-cycle; Combustion; or Chemical Conversion technologies since it uses little electricity, only 1 gpm of water, and has a catalyst lifetime of more than 4,600 hours. The SCDS-60 has a footprint of only 37" Wx19.5 " Dx77"H. and is fully S2-93 and CE compliant.
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