GaSonics PEP 4800DL Iridia
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Gasonics dual chamber etcher used to
independently deskin (remove a crusted
layer of photoresist without penetrating a
lower layer of conventional photoresist) or to
independently remove photoresist. Tool can
also be used in a two step process: deskin a
wafer and in a second step perform a
conventional as removal. The tool operates
while simultaneously producing microwave
energy and rf energy.