processing 88 (200 mm) wafers per hour.
Stepper incorporates an AERIAL Illuminator,
which allows extendibility beyond 0.25 µm
without compromising the excellent imaging
performance and high productivity. Stepper
features a variable NA (0.40-0.57) and a
resolution < 250 nm.
| NA |
Resolution |
Max X & Y |
2 pt. Global Alignment |
200 mm Wafers 70 Exp., 30mJ/cm2 |
| Variable 0.40 - 0.57 |
< 250 nm |
22 X 27.4 mm |
< 45 nm |
> 88 wph |
