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- CH-A Poly HT, Polysilicon deposition chamber doped and
undoped, 200mm, 450c - 1200c temp range, reduced pressure
- CH-C RTP; version MOD2 rapid thermal oxide deposition and
rapid thermal anneal (O2 and N2) 450C-1100C range, reduced
pressure
- CH-D HF clean chamber
- CH-F; Centura centerfinder
- Gaspanel; Centura HT gas panel
- Remote frame; Centura remote frame/VME controller
- Loadlocks; standard wide body
- Four vacuum pumps: loadlock, X-fer chamber, Poly chamber
- 20 GPM Bay Voltex heat exchanger for the RTP system
- BOC TCS-1 Effluent scrubber
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